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Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition

机译：通过空心 - 阴极等离子体辅助原子层沉积生长AlN薄膜的导电和介电弛豫特性

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Halit Altuntas; Turkan Bayrak; Seda Kizir; Ali Haider; Necmi Biyikli;
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1. Electrical conduction and dielectric relaxation properties of AIN thin films grown by hollow-cathode plasma-assisted atomic layer deposition [J] . Altuntas Halit, Bayrak Turkan, Kizir Seda, Semiconductor science and technology . 2016,第7期

机译：中空阴极等离子体辅助原子层沉积法生长AlN薄膜的电导和介电弛豫特性
2. Electrical conduction mechanisms and dielectric relaxation in Al2O3 thin films deposited by thermal atomic layer deposition [J] . Altuntas Halit, Kaplan Kemal Materials science in semiconductor processing . 2018,第期

机译：通过热原子层沉积沉积的Al2O3薄膜的电传导机制和介电弛豫
3. Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition [J] . Schiliro Emanuela, Giannazzo Filippo, Bongiorno Corrado, Materials science in semiconductor processing . 2019,第期

机译：通过等离子体增强原子层沉积GaN基材对AlN薄膜的结构和电性能
4. Hollow-cathode plasma-assisted atomic layer deposition: A novel route for low-temperature synthesis of crystalline III-nitride thin films and nanostructures [C] . Biyikli Necmi, Ozgit-Akgun Cagla, Goldenberg Eda, Institute of Electrical and Electronics Engineers International Conference on Electronics and Nanotechnology . 2015

机译：中空阴极等离子体辅助原子层沉积：低温合成III族氮化物晶体薄膜和纳米结构的新途径
5. Nano-scale zirconia and hafnia dielectrics grown by atomic layer deposition: Crystallinity, interface structures and electrical properties. [D] . Kim, Hyoungsub. 2004

机译：通过原子层沉积生长的纳米级氧化锆和氧化f电介质：结晶度，界面结构和电性能。
6. Effects of Rapid Thermal Annealing on the Structural Electrical and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition [O] . Jingjin Wu, Yinchao Zhao, Ce Zhou Zhao, 2016

机译：快速热退火对原子层沉积生长Zr掺杂ZnO薄膜的结构电学和光学性质的影响
7. Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition [O] . Alevli, M., Gungor, N., Haider, A., 2016

机译：衬底温度对中空阴极等离子体辅助原子层沉积生长GaN薄膜性能的影响

Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition

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