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Fast Deposition of Silicon Nitride and Aluminum Nitride on Nickel Titanium Substrates Using an Expanding Thermal Arc

机译:利用膨胀热电极快速沉积镍钛基板上的氮化硅和氮化铝

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This report results from a contract tasking Eindhoven University of Technology as follows: The contractor will investigate the feasibility of depositing SiNx or AlNx on substrates such as Ti or NiTi alloys. He will deliver samples of deposition. Also. he will transfer technology to USAF scientists at Wright Lab in Dayton Ohio.

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