High-Resolution, Large-Area, Nano Imprint Lithography

摘要

This document contains results from four different basic research projects under the Phase I of US-Korea NBIT Program (2007-2010). It is the 2nd year results covering research results from 2008-2009. It begins with the fourth report, 'High-resolution, Large-Area, Nano Imprint Lithography Using Electron Lattice Images and Electron-emitting Nanoprobes' by US primary investigator, Prof. Sungho Jin, UC San Diego, and the Korean primary investigator, Ki-Bum Kim, Seoul National University. It is followed by chapters: 1) 'SiGe Alloy Nanowire Photonics' by Prof. Moon-Ho Jo, Department of Materials Science and Engineering, POSTECH, Korea and Prof. Hongkun Park, Department of Chemistry and Chemical Biology, Harvard University; 2)'Self- Assembled Liquid Crystalline Gels: From Nanostructure to Function' by Prof. Soo- Young Park, Department of Polymer Science, Kyungpook National University, Korea; 3) 'Extremely Low Noise CNT for Peltier and Photo- Detector Device Application' by Prof. Young-Hee Lee, Department of Physics, SungKyunkwan University, Korea, Moon J. Kim, University of Texas at Dallas, and Minhee Yun, University of Pittsburgh.