Attainment of 0.13-micrometer Lines and Spaces by Excimer-Laser Projection Lithography in 'Diamond-Like' Carbon-Resist

摘要

Recent results are reported for the use of diamond like hard carbon as a photoresist for excimer-laser projection lithography. Well resolved 0.13 micrometers lines and spaces have been achieved using 193 nm radiation and reflective optics.