Pulsed Laser Deposition Improvements by Self-Directed Control

摘要

Improvements in material thin coatings for the year 2000 and beyond require aradical new approach to deposition processes. Pulsed Laser Deposition (PLD) is one such deposition process which offers deposition of complex materials currently not possible with other deposition methods. Unfortunately, it is not enough to control thin film material composition, but thin film stoichiometry, micro and macro stress and strain, and thickness as well. It is also desirable to have a deposition process that is easy to use and is repeatable. In order to propel the current thin film deposition culture into accepting PLD as a manufacturing process, the automation of PLD is inevitable. The inception, development, and implementation of PLD automation methods is the aim of this document.