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首页> 外文期刊>Semiconductors >Theoretical and Experimental Study of the Effect of InAs Growth Rate on the Properties of QD Arrays in InAs/GaAs System
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Theoretical and Experimental Study of the Effect of InAs Growth Rate on the Properties of QD Arrays in InAs/GaAs System

机译:InAs生长速率对InAs / GaAs系统中量子点阵列性能影响的理论和实验研究

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摘要

The dependence of properties of quantum dot (QD) arrays in an InAs/GaAs system on the InAs growth rate has been investigated theoretically and experimentally. The derived kinetic model of the formation of coherent nanoislands allows the calculation of the average size, surface density of islands, and wetting layer thickness as functions of the growth time and conditions. optical properties of InAs/GaAs QDs have been studied for the case of two monolayers (ML) of the material deposited at different growth rates. Predictions of the theoretical model are compared with the experimental data. it is shown that with two ML of the deosited material the characteristic lateral size of QDs decreases and teh thickness of the residual wetting layer increases with rising growth rate.
机译:从理论和实验上研究了InAs / GaAs系统中量子点(QD)阵列的特性对InAs生长速率的依赖性。导出的形成相干纳米岛的动力学模型可以计算平均大小,岛的表面密度和润湿层厚度,这些都是生长时间和条件的函数。对于以不同生长速率沉积的材料的两个单层(ML),已经研究了InAs / GaAs QD的光学特性。理论模型的预测与实验数据进行了比较。结果表明,随着去污材料的含量为2 ML,QDs的特征横向尺寸会减小,而残余润湿层的厚度会随着生长速率的增加而增加。

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