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首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >Highly conductive and transparent Ga-doped ZnO thin films deposited by chemical spray pyrolysis
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Highly conductive and transparent Ga-doped ZnO thin films deposited by chemical spray pyrolysis

机译:通过化学喷雾热解沉积的高导电透明Ga掺杂ZnO薄膜

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摘要

Undoped and Ga doped ZnO thin films were deposited on borosilicate glass substrates via a simple but effective chemical spray pyrolysis technique. The samples were characterised by X-ray diffractometer, UV-vis spectrophotometry, Scanning electron microscopy and I-V measurements. The structural, morphological and optical properties were studied as a function of increasing Ga doping concentration from 0 to 7 at.%. XRD results revealed that the films were polycrystalline with hexagonal wurtzite crystal structure. Increasing Ga dopant concentration decreased the crystallite size from 74 to 19 nm whilst the band gap, dislocation density and lattice strain shifted to higher values. All the films exhibited high transmittance of about 85% in the entire visible spectral range. Lowest resistivity of 1.47 x 10(-4) Omega cm was obtained at 3 at.% Ga concentration. (C) 2016 Elsevier GmbH. All rights reserved.
机译:通过简单但有效的化学喷雾热解技术将未掺杂和Ga掺杂的ZnO薄膜沉积在硼硅酸盐玻璃基板上。通过X射线衍射仪,紫外可见分光光度法,扫描电子显微镜和IV测量来表征样品。研究了将Ga掺杂浓度从0增加到7 at。%的函数的结构,形态和光学性质。 XRD结果表明该膜为具有六方纤锌矿晶体结构的多晶体。 Ga掺杂剂浓度的增加将微晶尺寸从74 nm减小到19 nm,而带隙,位错密度和晶格应变移至更高的值。所有薄膜在整个可见光谱范围内均显示出约85%的高透射率。在3 at。%Ga浓度下获得最低电阻率为1.47 x 10(-4)Ωcm。 (C)2016 Elsevier GmbH。版权所有。

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