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A Study on Low Cost-Highly Transparent and Conductive Molybdenum Doped Zinc Oxide Thin Films Deposited by Spray Pyrolysis Technique

机译:喷雾热解法沉积低成本高透明导电钼掺杂氧化锌薄膜的研究

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Pure zinc oxide (ZnO) and Molybdenum doped zinc oxide (Mo:ZnO) thin films were deposited at 673K on micro slide glass substrates using spray pyrolysis technique. Deposited thin films are characterized by X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and UV-Visible Spectroscopy techniques. X-ray diffraction analysis of the ZnO films confirm the formation of hexagonal wurtzite crystal system and the preferred growth orientation is along (002) plane for pure and Mo doped (0.25 wt.%, 0.75 wt.% and 1 wt.%) ZnO films. For the 0.5 wt.% Mo:ZnO thin film, the (101) peak becomes prominent. The XRD intensity of the (002) peak decreases with increasing Mo doping concentration for 0.25 wt.% and 0.5wt.% then the intensity of (002) plane increases for 0.75 wt.% and 1 wt.% of Mo doping. Lattice parameter, dislocation density and strain were evaluated for the pure and Mo:ZnO thin films. Scanning Electron microscope images show nearly uniform distribution of grains on the surface of the pure and molybdenum doped zinc oxide films (Figure 1). Atomic force microscopy results show that the root mean square roughness decreases with increasing Mo concentration for the film. An average visible transmittance (AVT) of about 88% is recorded in the visible range of 400-800 nm wavelengths. Slight increase in the bandgap of ZnO is observed with increasing Mo.
机译:使用喷雾热解技术将纯氧化锌(ZnO)和掺钼的氧化锌(Mo:ZnO)薄膜在673K上沉积在微型载玻片基板上。沉积的薄膜的特征在于X射线衍射(XRD),扫描电子显微镜(SEM),原子力显微镜(AFM)和紫外可见光谱技术。 ZnO膜的X射线衍射分析证实了六方纤锌矿晶体系统的形成,对于纯净和Mo掺杂(0.25 wt。%,0.75 wt。%和1 wt。%)的ZnO,优选的生长方向是沿着(002)平面电影。对于0.5重量%的Mo:ZnO薄膜,(101)峰变得显着。 (002)峰的XRD强度随着0.25重量%和0.5重量%的Mo掺杂浓度的增加而降低,然后,对于0.75重量%和1重量%的Mo掺杂,(002)面的强度增加。对纯薄膜和Mo:ZnO薄膜的晶格参数,位错密度和应变进行了评估。扫描电子显微镜图像显示,在纯钼掺杂的氧化锌膜表面上晶粒几乎均匀分布(图1)。原子力显微镜结果表明,随着膜中Mo浓度的增加,均方根粗糙度降低。在400-800 nm波长的可见光范围内,记录的平均可见光透射率(AVT)约为88%。观察到随着Mo的增加,ZnO的带隙略有增加。

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