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Highly conductive and transparent ZnO thin films prepared by spray pyrolysis technique

机译:喷雾热解技术制备的高导电透明ZnO薄膜

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摘要

Thin layers of pure and Al-doped zinc oxide of 0.2 μm thickness have been prepared by spray pyrolysis of aqueous solution of ZnCl_2 on borosilicate slides at temperature of 430℃. Doping is achieved by adding AlCl_3 to the solution (by weight ratio), which is mixed thoroughly prior to spraying, using the air as the carrier gas. Substrate temperature has been found to be the most important film preparation parameter. The optimum substrate temperature was obtained by looking for maximum electrical conductivity accompanied by good optical properties. This substrate temperature was found to be 430℃, giving conductivities of 0.023(Ω cm)~(-1) and 0.3(Ω cm)~(-1), for pure and 0.3% Al-doped films, respectively, and having optical transmittance at solar maximum of 85 and 70%, for pure and doped samples, respectively. The ZnO films prepared are polycrystalline but retain wuertzite structure with preferred orientations of (0 0 2) and (100). The effect of doping and annealing on the crystalline structure was studied, by investigating the X-ray patterns obtained for films with different doping before and after annealing at 400℃ in Argon for 40 min. The film sensitivity to CO and C_4H_(10) gases was evaluated by studying the electrical conductivity as a function of gas molar concentrations.
机译:通过在430℃的温度下将ZnCl_2水溶液喷雾热解在硼硅酸盐载玻片上,制备了厚度为0.2μm的纯铝掺杂锌薄层。掺杂是通过将AlCl_3添加到溶液中(按重量比计)来实现的,该溶液在喷涂前使用空气作为载气充分混合。已经发现基材温度是最重要的膜制备参数。通过寻找具有良好光学性能的最大电导率来获得最佳基板温度。发现该衬底温度为430℃,对于纯铝膜和0.3%铝掺杂膜,其电导率分别为0.023(Ωcm)〜(-1)和0.3(Ωcm)〜(-1)。纯样品和掺杂样品在日光最大透过率分别为85%和70%。制备的ZnO薄膜是多晶的,但保留了方石英结构,其优选取向为(0 0 2)和(100)。通过研究在氩气中400℃退火40分钟前后不同掺杂的薄膜获得的X射线图谱,研究了掺杂和退火对晶体结构的影响。通过研究电导率随气体摩尔浓度的变化,评估薄膜对CO和C_4H_(10)气体的敏感性。

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