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Transport properties and growth parameters of PdC and WC nanowires prepared in a dual-beam microscope

机译:双束显微镜制备的PdC和WC纳米线的传输性质和生长参数

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摘要

In this work we investigate the electrical transport properties and growth conditions of tungsten carbon (WC) and palladium carbon (PdC) nanostructures on Si substrates using a focused ion beam and scanning electron microscope. In situ energy dispersive x-ray (EDX) characterizations reveal that electron-beam-induced WC and PdC nanostructure depositions (EBID) show a lower metal concentration (below 3 percent atomic percentage) than in ion-beam-induced deposition (IBID) (above 20 percent). In the case of PdC the growth pattern and the Pd/C content were optimized by adjusting the deposition temperature of the precursor material. In situ measurements of the resistivity of the nanostructures as a function of thickness reveal a minimum at a thickness approx 200 nm. The lowest resistivity obtained for the PdC and WC structures is two orders of magnitude higher than the corresponding bulk values for pure Pd and W. The EBID samples show a non-metallic behaviour due to the low metal content. The temperature and magnetic field dependence of the IBID structures reveal a behaviour similar to disordered or granular conductors. The upper critical field and critical current density of the WC structures were measured below the superconducting critical temperature of approx 5 K.
机译:在这项工作中,我们使用聚焦离子束和扫描电子显微镜研究了硅衬底上钨碳(WC)和钯碳(PdC)纳米结构的电传输性质和生长条件。原位能量色散X射线(EDX)表征显示,电子束诱导的WC和PdC纳米结构沉积物(EBID)的金属浓度(低于3%原子百分比)低于离子束诱导的沉积物(IBID)( 20%以上)。在PdC的情况下,通过调节前体材料的沉积温度可以优化生长方式和Pd / C含量。纳米结构的电阻率随厚度的原位测量显示出在约200 nm处的最小值。对于PdC和WC结构,获得的最低电阻率比纯Pd和W的相应体积值高两个数量级。EBID样品由于金属含量低而显示出非金属行为。 IBID结构的温度和磁场依赖性显示出类似于无序或颗粒状导体的行为。在低于约5 K的超导临界温度下测量WC结构的上部临界场和临界电流密度。

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