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Growth and Photovoltaic Properties of High-Quality GaAs Nanowires Prepared by the Two-Source CVD Method

机译:双源CVD法制备高质量GaAs纳米线的生长和光伏性能

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摘要

Growing high-quality and low-cost GaAs nanowires (NWs) as well as fabricating high-performance NW solar cells by facile means is an important development towards the cost-effective next-generation photovoltaics. In this work, highly crystalline, dense, and long GaAs NWs are successfully synthesized using a two-source method on non-crystalline SiO2 substrates by a simple solid-source chemical vapor deposition method. The high V/III ratio and precursor concentration enabled by this two-source configuration can significantly benefit the NW growth and suppress the crystal defect formation as compared with the conventional one-source system. Since less NW crystal defects would contribute fewer electrons being trapped by the surface oxides, the p-type conductivity is then greatly enhanced as revealed by the electrical characterization of fabricated NW devices. Furthermore, the individual single NW and high-density NW parallel arrays achieved by contact printing can be effectively fabricated into Schottky barrier solar cells simply by employing asymmetric Ni-Al contacts, along with an open circuit voltage of ~0.3 V. All these results indicate the technological promise of these high-quality two-source grown GaAs NWs, especially for the realization of facile Schottky solar cells utilizing the asymmetric Ni-Al contact.Electronic supplementary materialThe online version of this article (doi:10.1186/s11671-016-1420-y) contains supplementary material, which is available to authorized users.
机译:高质量,低成本的GaAs纳米线(NW)的增长以及通过简便的方法制造高性能NW太阳能电池,是向具有成本效益的下一代光伏技术迈出的重要一步。在这项工作中,通过简单的固体源化学气相沉积方法,在非晶SiO2衬底上使用双源方法成功地合成了高度结晶,致密且长的GaAs NW。与传统的单源系统相比,通过这种双源配置实现的高V / III比和前驱体浓度可以极大地有利于NW生长并抑制晶体缺陷的形成。由于较少的NW晶体缺陷将贡献较少的电子被表面氧化物捕获,因此p型电导率会大大提高,如制造的NW器件的电学特性所揭示的那样。此外,只需采用不对称的Ni-Al触点以及约0.3V的开路电压,就可以有效地将通过接触印刷获得的单个单个NW和高密度NW平行阵列有效地制成肖特基势垒太阳能电池。这些高质量的两源增长型GaAs NW的技术前景,尤其是利用不对称的Ni-Al接触实现便捷的肖特基太阳能电池。电子补充材料本文的在线版本(doi:10.1186 / s11671-016-1420 -y)包含补充材料,授权用户可以使用。

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