Formation of Integrated Nanosized Graphene Structures by Focused IonBeam Etching

摘要

Ionbeam methods of nanostructure formation in multigraphene layers integrated with a system of currentcarrying electrodes during microelectronic group processing have been developed. The results demonstrate the feasibility of both thinning the structures down to several graphene layers and forming quasi onedimensional strips on the basis of the structures.