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Ohmic contacts on p-GaN (Part I): investigation of different contact metals and their thermal treatment

机译:p-GaN上的欧姆接触(第I部分):不同接触金属及其热处理的研究

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摘要

The changes in contact resistivity and I-V curve linearity after annealing of Pd, Ni/Au, Cr/Au, Co/Au, Pt and Au contacts on p-GaN after tempering below and above 500 ℃ have been investigated. CTLM-layered structures on p-GaN were thermally stressed and electrically analyzed. The I-V curve linearity as a measure of ohmic behavior has been derived from the correlation coefficient of the I-V curves. Below 500 ℃ the Pd, Ni/Au, Cr/Au and Co/Au contacts become ohmic after annealing. The best final values of the specific contact resistance ρ_c after annealing increase in the sequence Ni/Au, Pd, Co/Au, Cr/Au, Au and Pt. After annealing above 500 ℃ the contact resistance increases for all contact materials and the linearity decreases. A competition between the formation of reaction phases at the interface and the decomposition of the p-GaN epi-layer in a probable reason for this behavior.
机译:研究了在500℃以上回火后,p-GaN上Pd,Ni / Au,Cr / Au,Co / Au,Pt和Au接触退火后,接触电阻率和I-V曲线线性的变化。对p-GaN上的CTLM层结构进行热应力和电分析。从欧姆曲线的相关系数中得出了欧姆曲线线性度的欧姆曲线。低于500℃时,退火后Pd,Ni / Au,Cr / Au和Co / Au接触变为欧姆。退火后的比接触电阻ρ_c的最佳最终值以Ni / Au,Pd,Co / Au,Cr / Au,Au和Pt的顺序增加。在500℃以上退火后,所有接触材料的接触电阻均增加,线性下降。在此行为的可能原因中,界面处反应相的形成与p-GaN外延层的分解之间存在竞争。

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