Influence of BF_2-Implantation on the Roughness or Cobalt Silicide/Silicon Interfaces

摘要

Thin CoSi_2 layers were prepared with different methods and implanted with BF_2. The root mean square roughness and the maximum roughness of the silicide/silicon interface are measured before and after implanting through the layer stack by an atomic force microscope after etching of the CoSi_2. The results show the relevance of the implantation on the silicide/silicon interface.