首页> 外文期刊>Integrated Ferroelectrics >PREPARATION AND ELECTRICAL PROPERTIES OF SOL-GEL DERIVED (1-x)Pb(Zn_(1/3)Nb_(2/3))O_(3-x)Pb(Zr_(0.4)Ti_(0.6))O_3 (x = 0.6) THIN FILMS
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PREPARATION AND ELECTRICAL PROPERTIES OF SOL-GEL DERIVED (1-x)Pb(Zn_(1/3)Nb_(2/3))O_(3-x)Pb(Zr_(0.4)Ti_(0.6))O_3 (x = 0.6) THIN FILMS

机译:溶胶-凝胶衍生的(1-x)Pb(Zn_(1/3)Nb_(2/3))O_(3-x)Pb(Zr_(0.4)Ti_(0.6))O_3的制备和电性能0.6)薄膜

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摘要

Films of (1-x)Pb(Zn_(1/3)Nb_(2/3))O_3-xPb(Zr_(0.4)Ti_(0.6))O_3 (x = 0.6, 40 PZN-60PZT) were deposited on Pt/TiO_2/SiO_2/Si substrate through spin coating. Using a combination of homogeneous precursor solutions and two-step pyrolysis process, it was possible to obtain the 40PZN-60PZT thin films of perovskite phase virtually without pyrochlore phase precipitation after annealing above 650 deg C. The root-mean-square surface roughness of a 220 nm thick film was 3 ran as measured by the atomic force microscopy. The 40PZN-60PZT films annealed at 720 deg C showed a well-saturated hysteresis loop at an applied voltage of 5 V with remanent polarization (P_r) and coercive voltage (V_c) of 29 mu C/cm~2 and 0.8 V, respectively. The leakage current density was lower than 10~(-6) A/cm2 at an applied voltage of 2.5 V.
机译:将(1-x)Pb(Zn_(1/3)Nb_(2/3))O_3-xPb(Zr_(0.4)Ti_(0.6))O_3(x = 0.6,40 PZN-60PZT)沉积/ TiO_2 / SiO_2 / Si衬底通过旋涂。使用均相前体溶液和两步热解工艺的组合,可以在650℃以上退火后获得钙钛矿相的40PZN-60PZT薄膜,而实际上几乎没有烧绿石相沉淀。a的均方根表面粗糙度通过原子力显微镜测得220nm厚的膜为3nm。在720℃退火的40PZN-60PZT薄膜在5 V的施加电压下表现出充分饱和的磁滞回线,剩余极化(P_r)和矫顽电压(V_c)分别为29μC / cm〜2和0.8V。在2.5 V的施加电压下,漏电流密度低于10〜(-6)A / cm2。

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