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首页> 外文期刊>Journal of Applied Physics >Electrical properties and x-ray photoelectron spectroscopy studies of Bi(Zn_(0.5)Ti_(0.5))O_3 doped Pb(Zr_(0.4)Ti_(0.6))O_3 thin films
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Electrical properties and x-ray photoelectron spectroscopy studies of Bi(Zn_(0.5)Ti_(0.5))O_3 doped Pb(Zr_(0.4)Ti_(0.6))O_3 thin films

机译:Bi(Zn_(0.5)Ti_(0.5))O_3掺杂Pb(Zr_(0.4)Ti_(0.6))O_3薄膜的电性能和X射线光电子能谱研究

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摘要

(1-x)Pb(Zr_(0.4),Ti_(0.6))O_3-(x)Bi(Zn_(0.5),Ti_(0.5))O_3 (PZT-BZT) (x=0, 0.03, 0.05, 0.08, and 0.1) films were deposited on Pt(111)/Ti/SiO_2/Si(100) substrates by chemical solution deposition using spin-coating. All samples showed highly (111) oriented perovskite phase and no other phase was observed. The ferroelectric properties of PZT-BZT films were systematically investigated as a function of the content x of the BZT solution. It is found that BZT doping in PZT films could greatly enhance the remnant polarization (P_r), as well as improve the fatigue property. In a 3 wt % BZT-doped PZT film, the 2P_r and the coercive field (E_c) are 90 μC/cm~2 and 95 kV/cm at 10 kHz, respectively, at an electric field of 500 kV/cm, and the leakage current density is less than 1 × 10~(-7) A/cm~2. The impact of BZT doping on the structure of PZT has been investigated by x-ray photoelectron spectroscopy.
机译:(1-x)Pb(Zr_(0.4),Ti_(0.6))O_3-(x)Bi(Zn_(0.5),Ti_(0.5))O_3(PZT-BZT)(x = 0,0.03,0.05,0.08通过旋涂化学溶液沉积法在Pt(111)/ Ti / SiO_2 / Si(100)基板上沉积0.1)膜。所有样品均显示出高度(111)取向的钙钛矿相,未观察到其他相。系统地研究了PZT-BZT薄膜的铁电性能随BZT溶液含量x的变化。发现在PZT薄膜中掺杂BZT可以极大地增强剩余极化率(P_r),并改善疲劳性能。在3 wt%的BZT掺杂的PZT膜中,2P_r和矫顽场(E_c)在500 kHz / cm的电场下于10 kHz时分别为90μC/ cm〜2和95 kV / cm。漏电流密度小于1×10〜(-7)A / cm〜2。 X射线光电子能谱研究了BZT掺杂对PZT结构的影响。

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  • 来源
    《Journal of Applied Physics》 |2010年第8期|p.084101.1-084101.5|共5页
  • 作者单位

    Key Laboratory of Low Dimensional Materials and Application Technology, Xiangtan University, Ministry of Education, Xiangtan, Hunan 411105, People's Republic of China,Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    rnKey Laboratory of Low Dimensional Materials and Application Technology, Xiangtan University, Ministry of Education, Xiangtan, Hunan 411105, People's Republic of China;

    rnKey Laboratory of Low Dimensional Materials and Application Technology, Xiangtan University, Ministry of Education, Xiangtan, Hunan 411105, People's Republic of China;

    rnInterdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    rnFujitsu Laboratories, Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan;

    rnInterdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    rnLaboratory for Quantum Engineering and Micro-Nano Energy Technology, Xiangtan University, Xiangtan, Hunan 411105, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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