机译:GE1-ysny(Y = 4.3%-9.0%)在GE缓冲SI上生长的温度依赖性光致发光研究:直接带隙交叉点的证据
Kangwon Natl Univ Dept Phys Chunchon 24341 South Korea;
Air Force Inst Technol Dept Engn Phys Wright Patterson AFB OH 45433 USA;
Air Force Inst Technol Dept Engn Phys Wright Patterson AFB OH 45433 USA;
Air Force Inst Technol Dept Engn Phys Wright Patterson AFB OH 45433 USA;
Air Force Inst Technol Dept Engn Phys Wright Patterson AFB OH 45433 USA;
Yeungnam Univ Dept Phys Gyongsan 38541 South Korea;
Yeungnam Univ Dept Phys Gyongsan 38541 South Korea;
Arizona State Univ Sch Mol Sci Tempe AZ 85287 USA;
Germanium tin; Alloys; Photoluminescence; Ultra-high vacuum chemical vapor deposition; Photoreflectance; 78; 55; -m; 68; 55; ag; 81; 15; Gh; 61; 66; Dk;
机译:GE1-ysny(Y = 4.3%-9.0%)在GE缓冲SI上生长的温度依赖性光致发光研究:直接带隙交叉点的证据
机译:在硅上生长具有2230 siliconnm光致发光的直接带隙GeSn
机译:在带2230 nm光致发光的硅上生长的直接带隙GeSn
机译:通过分子束外延生长的堆叠INAS自组装量子点结构的异常温度依赖性光致发光特性
机译:带隙工程GaAsSb纳米线分子束外延生长的微光致发光研究
机译:可调带隙:六边形至四角形ZnSe结构转变的模拟证据:具有宽范围可调直接带隙的单层材料(Adv。Sci。12/2015)
机译:Ge-缓冲si上的Ge1-ysny(y = 0.01-0.10)合金:合成,微观结构和光学性质
机译:分子束外延生长直接和间接带隙alxGa1-xas合金的单声子拉曼光谱和光致发光研究。