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Direct-bandgap GeSn grown on silicon with 2230 nm photoluminescence

机译:在硅上生长具有2230 siliconnm光致发光的直接带隙GeSn

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摘要

Material and optical characterizations have been conducted for epitaxially grown GeSn thin films on Si with Sn composition up to 10%. A direct bandgap GeSn alloy has been identified by temperature-dependent photoluminescence (PL) study based on the single peak spectrum and the narrow line-width. Room temperature PL emission as long as 2230 nm has also been observed from the same sample.
机译:已经在具有高达10%的Sn组成的Si上外延生长GeSn薄膜进行了材料和光学表征。通过基于温度的光致发光(PL)研究已基于单峰光谱和窄线宽确定了直接带隙GeSn合金。从同一样品中还观察到室温PL发射长达2230 nm。

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