Effect of deposition parameters on surface roughness and consequent electromagnetic performance of capacitive RF MEMS switches: a review

摘要

Surface roughness seriously affects the electromagnetic performance of capacitive radio frequency (RF) micro-electromechanical system (MEMS) switches. This review presents the effects of different film thickness values, substrate topologies, sputtering powers, gas pressures, gas ratios, substrate temperatures and annealing temperatures on the surface roughness of deposited thin films. At the same time, the mechanisms of the deposition parameters on the surface roughness are also analyzed. The effects of surface roughness on the electromagnetic performance of capacitive RF MEMS switches are then discussed in detail. Finally, two different methods for improving the surface roughness of deposited thin films are given.