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首页> 外文期刊>Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena >Orthogonal Defect Solutions for Silicon Crystal Growth and Wafer Processing
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Orthogonal Defect Solutions for Silicon Crystal Growth and Wafer Processing

机译:硅晶体生长和晶片加工的正交缺陷解决方案

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The silicon industry is a maturing one. Mature industries have, or should have, different concrns than young industries. One of the features which characterized the silicon industry in its youth is that of defect engineering. Defect issues such as the control of oxygen precipitation and intrinsic point defect related micro-defects have been at the centre of this enterprise for many years. These are very difficult and complex problems from both a scientific and an engineering point of view. They are, importantly, highly coupled problems. Because of the complexity inherent in some of these problems, more often that not solutions to issues presented by such problems have produced rather highly tuned measures specific to certain applications. It has also produced armies of application engineers and commodity teams whose job is, among other things, to manage this complexity and the problems of material specification in such an environment. But this is not the way a mature industry behaves. For a variety of reasons, a mature industry strives for solutions which are as generic as possible; a mature industry strives to reduce the inherent costs of highly engineered specific solutions. A mature industry tries, where possible, to sidestep complexity; a mature industry strives for solutions to specific problems which are orthogonal to the solutions for other problems. In other words, it needs solutions which cannot create problems elsewhere in the complex environment in which it operates. We have by no means yet reached full orthogonality of defect solutions for silicon, but we approaching it. And indeed some of the issues with silicon wafers simply do not lend themselves to such principles of orthogonality. But we must strive to apply them where they are possible. This paper discusses two such orthogonal solutions to the immensely important problems of oxygen precipitation and micro-defect control in silicon wafers: the Magic Denuded Zone (MDZ) and Perfect Silicon.
机译:硅工业是一个成熟的行业。成熟的行业,或者应该有不同的混凝剂而不是年轻行业。其中一个特征的特征之一,它在青年中表现为“缺陷工程”的特征。缺陷问题,如控制氧气降水和内在点缺陷相关的微缺陷已在本企业的中心多年。这些是来自科学和工程观点的非常困难和复杂的问题。它们是重要的,非常耦合的问题。由于一些问题所固有的复杂性,因此,这些问题所呈现的问题的问题更常见地产生了特定于某些应用程序的相当高度调整的措施。它还产生了应用工程师和商品团队的军队,其中工作是在这种环境中管理这种复杂性和材料规范的问题。但这不是成熟行业的行为方式。由于各种原因,成熟的行业致力于尽可能通用的解决方案;成熟的行业努力降低高度设计的特定解决方案的固有成本。在可能的情况下,成熟的行业都在可能,以追回的复杂性;成熟的行业努力解决对其他问题的解决方案正交的特定问题的解决方案。换句话说,它需要解决方案,该解决方案无法在其运行的复杂环境中为其他地方产生问题。我们没有达到完整的“正交问题”,芯片缺陷解决方案,但我们接近它。事实上,硅晶片的一些问题根本不会借给这种正交性原则。但我们必须努力将它们应用在一起。本文讨论了硅晶片中氧沉淀和微缺陷控制的大致重要问题的两个如此正交问题:魔术剥蚀区(MDZ)和完美的硅。

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