机译:硼掺杂水平对硼掺杂微晶金刚石(BDMCD)膜的基本力学性能和腐蚀行为的影响
Shanghai Jiao Tong Univ Sch Mech Engn State Key Lab Mech Syst &
Vibrat Shanghai 200240 Peoples R China;
Shanghai Jiao Tong Univ Sch Mech Engn State Key Lab Mech Syst &
Vibrat Shanghai 200240 Peoples R China;
Shanghai Jiao Tong Univ Sch Mech Engn State Key Lab Mech Syst &
Vibrat Shanghai 200240 Peoples R China;
Shanghai Jiao Tong Univ Sch Mech Engn State Key Lab Mech Syst &
Vibrat Shanghai 200240 Peoples R China;
BDMCD film; Boron doping level; Basic mechanical properties; Film-substrate adhesive strength; Erosion behavior;
机译:硼掺杂水平对硼掺杂微晶金刚石(BDMCD)膜的基本力学性能和腐蚀行为的影响
机译:微晶,纳米晶和掺硼金刚石薄膜的断裂和固体颗粒侵蚀
机译:生长压力对掺硼多晶金刚石薄膜电学性能的影响
机译:硼掺杂金刚石碳(B-DLC)膜的机械性能和摩擦学行为
机译:化学气相沉积硼掺杂多晶金刚石薄膜在硅和蓝宝石上的生长:生长,掺杂,金属化和表征
机译:未掺杂和硼掺杂纳米晶金刚石薄膜的摩擦学性质
机译:硼掺杂CVD金刚石薄膜的力学性能