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Characterization of the Ion Beam Current Density of the RF Ion Source with Flat and Convex Extraction Systems

机译:具有平坦和凸提取系统的RF离子源的离子束电流密度的表征

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The characterization of ion beam current density distribution and beam uniformity is crucial for improving broad-beam ion source technologies. The design of the broad ion beam extraction system directly affects these two parameters, therefore, depending on the application, the design and geometry of the source is changed. In this study, the effect of the presence or the absence of a neutralization process on the ion beam density was investigated. Also, the effect of the probe bias on the ion beam current measurement was evaluated. Eventually, using a flat probe, the ion beam profiles obtained from the extraction system of the ion source (Model RFIS 60, ACECR, Iran) were measured at energies from 300 eV to 1000 eV and compared in terms of current and uniformity of the ion beam in the absence of the neutralizer. In these experiments, screen and accelerator grids with different geometries (flat and convex grids) were used for comparison purposes. According to the obtained results, the flat grids generate a higher current density while the convex grids generate a more uniform beam. Therefore, each of these grid geometries can be suitable depending on the desired application.
机译:离子束电流密度分布的表征和光束均匀性对于改善宽梁离子源技术至关重要。宽离子束提取系统的设计直接影响这两个参数,因此,根据应用,源的设计和几何图形更改。在该研究中,研究了存在或不存在中和过程对离子束密度的影响。而且,评估了探针偏置对离子束电流测量的影响。最终,使用扁平探针,从离子源(模型RFIS 60,ACECR,IRAN)的提取系统获得的离子束型材在300eV至1000eV的能量下测量,并在离子的电流和均匀性方面进行比较梁在没有中和剂的情况下。在这些实验中,使用具有不同几何形状的屏幕和加速器栅格(平板和凸形网格)进行比较目的。根据所得结果,平板电网产生更高的电流密度,而凸形电网产生更均匀的光束。因此,这些网格几何形状中的每一个可以根据所需的应用而合适。

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