ION SOURCES AND METHODS FOR GENERATING ION BEAMS WITH CONTROLLABLE ION CURRENT DENSITY DISTRIBUTIONS OVER LARGE TREATMENT AREAS

摘要

The present invention relates to an ion supply source. The ion supply source comprises at least one electromagnet for changing distribution of plasma in a discharge space of an ion supply source. At least one of electromagnets is oriented around an outer peripheral part of a tubular sidewall of the ion supply source to change the distribution of plasma around a peripheral area of the discharge space.