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Electroreflectance spectra from multiple InGaN/GaN quantum wells in the nonuniform electric field of a p-n junction

机译:来自多种Ingan / GaN量子阱的电脉络光谱在P-N结的非均匀电场中

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摘要

A line at E = 2.77 eV (with a width of I" = 88 meV) related to interband transitions in the region of multiple quantum wells in the active region is detected in the electroreflectance spectra of the GaN/InGaN/AlGaN heterostructure. As the modulation bias is reduced from 2.9 to 0.4 V, the above line is split into two lines with energies of E (1) = 2.55 eV and E (2) = 2.75 eV and widths of I"(1) = 66 meV and I"(2) = 74 meV, respectively. The smaller widths of separate lines indicate that these lines are caused by interband transitions in particular quantum wells within the active region. The difference between the interband transition energies E (1) and E (2) in identical quantum wells in the active region is related to the fact that the quantum wells are in an inhomogeneous electric field of the p-n junction. The magnitudes of the electric-field strengths in particular quantum wells in the active region of the heterostructure are estimated to be 1.6 and 2.2 MV/cm.
机译:在GaN / Ingan / AlGaN异质结构的电流光谱中检测到与有源区中的多量子阱区域中的与间带转换有关的e = 2.77eV(具有I“= 88MeV的宽度)。作为 调制偏压从2.9降至0.4V,上述线分成两条线,其能量为e(1)= 2.55eV和e(2)= 2.75eV和i“(1)= 66 mev和i”的宽度 (2)分别= 74 mev。单独线的较小宽度表明这些线是由活动区域内的特定量子阱中的间带转换引起的。间带间转换能量e(1)和e(2)之间的差异 有源区中的相同量子阱与量子孔处于PN结的不均匀电场的事实有关。估计异质结构的有源区中特别量子孔的电场强度的大小估计是 1.6和2.2 mV / cm。

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