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首页> 外文期刊>Advanced materials interfaces >Depletion Layer Built-In Field at (1.100), (0001), and (000.1) GaN/Water Junction and Its Role in Semiconductor Nanowire Water Splitting
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Depletion Layer Built-In Field at (1.100), (0001), and (000.1) GaN/Water Junction and Its Role in Semiconductor Nanowire Water Splitting

机译:(1.100),(0001)和(000.1)GaN /水交界处的耗尽层内置场和其在半导体纳米线水分裂中的作用

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摘要

The nature of specific GaN plane/water interfaces under external bias and illumination can influence photoelectrolysis efficiency using GaN nanowires. Studies of Ga-polar, N-polar, and m-plane GaN interfaces with deionized water allow determining differences between surfaces corresponding to different nanowire facets. They are investigated under external bias conditions to reveal the profile of Fermi level localization through analysis of Franz-Keldysh oscillations using electrolyte electroreflectance (EER) technique in a specially designed measurement chamber. Calculation of the potential barrier height is also possible. EER study shows differences between surface densities of states (SDOS) at distinct GaN planes. One broad SDOS is identified near the conduction band in case of ±c-plane and related to Ga adatom reconstruction and β-Ga_2O_3 presence at the GaN electrode. Two narrow SDOS singularities are found at the m-plane one of which is localized near the middle of the bandgap and allows to generate approximately two times higher surface potential barrier than in case of polar surfaces at zero-bias conditions. This suggests that n-type GaN nanowires can enhance carrier separation at sidewalls and refine the oxygen evolution rate. Additionally, a voltage-controlled hysteresis loop of Fermi level localization is detected at the Ga-face GaN/water interface.
机译:外部偏压和照明下的特定GaN平面/水界面的性质可以使用GaN纳米线影响光电解效应。具有去离子水的Ga极,N极和M平面GaN界面的研究允许确定对应于不同纳米线刻面的表面之间的差异。它们在外部偏压条件下进行了研究,以通过在特殊设计的测量室中使用电解质电气反射(eer)技术分析Franz-Keldysh振荡来揭示Fermi水平定位的轮廓。还可以计算潜在的屏障高度。 EER研究表明了不同GAN平面状态(SDO)的表面密度之间的差异。在±C平面的情况下,在导通带附近识别一个宽的SDO,并且在GaN电极处与Ga Adatom重建和β-Ga_2O_3存在相关。在M平面上发现两个窄的SDOS奇点在带隙的中间局部地定位,并且允许在零偏置条件下的极性表面的情况下产生大约两倍的表面电位屏障。这表明N型GaN纳米线可以在侧壁上增强载波分离并细化氧进化率。另外,在Ga-Face GaN /水界面处检测到FERMI水平定位的电压控制的磁滞回路。

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  • 来源
    《Advanced materials interfaces》 |2019年第4期|共9页
  • 作者单位

    Department of Applied Physics Stanford University Stanford CA 94305 USA;

    Faculty of Fundamental Problems of Technology Wroclaw University of Science and Technology Wybrze?e Wyspiańskiego 27 Wroc?aw PL-50370 Poland;

    Faculty of Microsystem Electronics and Photonics Wroclaw University of Science and Technology Janiszewskiego 11-17 Wroc?aw PL-50372 Poland;

    Institute of High-Pressure Physics Polish Academy of Sciences Soko?owska 29/37 Warsaw PL 01142 Poland;

    Institute of High-Pressure Physics Polish Academy of Sciences Soko?owska 29/37 Warsaw PL 01142 Poland;

    Faculty of Fundamental Problems of Technology Wroclaw University of Science and Technology Wybrze?e Wyspiańskiego 27 Wroc?aw PL-50370 Poland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    c-plane; GaN; m-plane; photoelectrolysis; surface states;

    机译:C平面;GaN;M平面;光电解;表面状态;

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