首页> 外国专利> FABRICATION METHOD OF GAN NANOWIRE PHOTOELECTRODE STRUCTURE FOR PHOTOELECTROCHEMICAL WATER SPLITTING

FABRICATION METHOD OF GAN NANOWIRE PHOTOELECTRODE STRUCTURE FOR PHOTOELECTROCHEMICAL WATER SPLITTING

机译:GaN纳米线光电极结构的制造方法,用于光电化学水分解

摘要

Disclosed is a method of manufacturing a gallium nitride nanowire photoelectrode structure for electrochemical water decomposition to increase water decomposition efficiency by maximizing a hydrogen generation reaction by maximizing a contact area between a gallium nitride nanowire photoelectrode and water A method of manufacturing a gallium nitride nanowire photoelectrode structure for electrochemical water decomposition according to the present invention comprises the steps of: (a) forming a metal catalyst layer on a substrate; (b) forming circular metal nanoparticles on the substrate by first annealing the substrate on which the metal catalyst layer is formed; (c) sequentially forming a Ga thin film layer and an In thin film layer on the substrate on which the circular metal nanoparticles are formed; (d) forming polygonal alloy nanoparticles by secondary annealing the substrate on which the Ga thin film layer and the In thin film layer are formed; And (e) forming a gallium nitride nanowire photoelectrode by growing polygonal nanowires using the polygonal alloy nanoparticles as seeds.
机译:公开了一种制造用于电化学水分解的氮化镓纳米线光电极结构的方法,通过通过最大化氮化镓纳米线光电极和水之间的接触面积来提高氢气产生反应来提高水分解效率。一种制造氮化镓纳米线光电极结构的方法对于根据本发明的电化学水分解,包括以下步骤:(a)在基材上形成金属催化剂层; (b)通过首先退火形成形成金属催化剂层的基材在基材上形成圆形金属纳米颗粒; (c)在形成圆形金属纳米颗粒的基材上依次形成Ga薄膜层和薄膜层; (d)通过二次退火形成多边形合金纳米颗粒,基板形成在该基板上,形成Ga薄膜层和薄膜层的基材; (e)通过使用多边形合金纳米粒子作为种子生长多边形纳米线形成氮化镓纳米线光电极。

著录项

  • 公开/公告号KR102250306B1

    专利类型

  • 公开/公告日2021-05-10

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020190096453

  • 发明设计人 라용호;전대우;

    申请日2019-08-08

  • 分类号C25B11/04;C25B1;C30B23/02;C30B29/40;

  • 国家 KR

  • 入库时间 2022-08-24 18:46:52

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