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Investigation of carrier transport mechanisms in the Cu-Zn-Se based hetero-structure grown by sputtering technique

机译:通过溅射技术生长Cu-Zn-Se的杂结构载流子输送机制研究

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摘要

In this paper, we present results of the electrical characterization of n-Si/p-Cu-Zn-Se hetero-structure. Sputtered film was found in Se-rich behavior with tetragonal polycrystalline nature along with (112) preferred orientation. The band gap energy for direct optical transitions was obtained as 2.65 eV. The results of the conductivity measurements indicated p-type behavior and carrier transport mechanism was modelled according to thermionic emission theory. Detailed electrical characterization of this structure was carried out with the help of temperature-dependent current-voltage measurements in the temperature range of 220-360 K, room temperature, and frequency-dependent capacitance-voltage and conductance-voltage measurements. The anomaly in current-voltage characteristics was related to barrier height inhomogeneity at the interface and modified by the assumption of Gaussian distribution of barrier height, in which mean barrier height and standard deviation at zero bias were found as 2.11 and 0.24 eV, respectively. Moreover, Richardson constant value was determined as 141.95 Acm(-2)K(-2) by means of modified Richardson plot.
机译:在本文中,我们存在N-Si / P-Cu-Zn-Se杂结构的电表征的结果。溅射膜在富含Se的行为中发现,具有四方多晶性质以及(112)优选的取向。获得用于直接光学转变的带隙能量为2.65eV。电导率测量结果表明p型行为和载波传输机制根据热离子发射理论进行建模。在温度依赖的电流 - 电压测量中,在220-360k,室温和频率依赖电容 - 电压和电导电压测量的帮助下进行这种结构的详细电气表征。电流 - 电压特性的异常与界面处的屏障高度不均匀有关,并且通过假设高斯的屏障高度分布的假设改性,其中均屏障高度和标准偏差分别被发现为2.11和0.24eV。此外,通过修改的理查森图,理查森恒定值确定为141.95 acm(-2)k(-2)。

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