首页> 外文期刊>Journal of nanoscience and nanotechnology >C-V-f, G-V-f and Z ''-Z ' Characteristics of n-Type Si/B-Doped p-Type Ultrananocrystalline Diamond Heterojunctions Formed via Pulsed Laser Deposition
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C-V-f, G-V-f and Z ''-Z ' Characteristics of n-Type Si/B-Doped p-Type Ultrananocrystalline Diamond Heterojunctions Formed via Pulsed Laser Deposition

机译:通过脉冲激光沉积形成的N型Si / B掺杂P型超声金刚石杂金金刚石杂交的C-V-F,G-V-F和Z'-Z'的特性

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n-Type Si/p-type B-doped ultrananocrystalline diamond heterojunction photodiodes were built using pulsed laser deposition at a heated substrate temperature of 550 degrees C. Following the capacitance-voltage-frequency (C-V-f) and conductance-voltage-frequency (G-V-f) plots, the series resistance (R-s) values at zero bias voltage were 154.41 Omega at 2 MHz and 1.72 k Omega at 40 kHz. R-s should be ascribed to R-s occurring in the metallic contact and the bulk resistance in the active layer. At 40 kHz, the interface state density (N-ss) was 1.78x10(13) eV(-1) cm(-2) and dropped exponentially to 1.39x10(12) eV(-1) cm(-2) at 2 MHz. An assessed Nss occurring at the heterojunction interface was the cause of deterioration in the photo-detection properties. At different V values, the appearance of the real (Z') and imaginary (Z '') characteristic curves revealed single semicircles whose centers lay below the Z' axis. The magnitude of the curve was diminished with the increment of V. The particularities of Z ''-Z ' plots can be identified as an equivalent circuit model. The appropriate model included Rs, which was combined with the parallel circuit of resistance and constant phase element.
机译:使用脉冲激光沉积在电容 - 电压 - 频率(CVF)和电压 - 电压 - 频率(GVF)之后,使用脉冲激光沉积在加热的基板温度下建造N型Si / P型B掺杂超混凝型金刚石异质结二极管。绘图,零偏置电压下的串联电阻(RS)值为154.41ω在2MHz,1.72k Omega,40 kHz。 R-S应归因于在金属接触中发生的R-S和活性层中的散热性。在40 kHz时,界面状态密度(N-SS)为1.78x10(13)eV(-1)cm(-2),并在2时逐渐降至1.39x10(12)eV(-1)厘米(-2) MHz。在异质结界面发生的评估NSS是光检测性能劣化的原因。在不同的V值,真实(Z')和虚(Z')特征曲线的外观显示了单个半圆形,其中心置于Z'轴下方。曲线的大小以V的增量降低。Z''-Z'图的特殊性可以被识别为等效电路模型。适当的模型包括Rs,其与电阻和恒定相结合的平行电路组合。

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