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Epitaxial graphene on SiC(0001) and SiC(000(1)over-bar): from surface reconstructions to carbon electronics

机译:SiC(0001)和SiC(000(1)上方)上的外延石墨烯:从表面重建到碳电子学

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Graphene with its unconventional two-dimensional electron gas properties promises a pathway towards nanoscaled carbon electronics. Large scale graphene layers for a possible application can be grown epitaxially on SiC by Si sublimation. Here we report on the initial growth of graphene on SiC basal plane surfaces and its relation to surface reconstructions. The surfaces were investigated by scanning tunneling microscopy (STM), low energy electron diffraction (LEED), angle-resolved ultraviolet photoelectron spectroscopy (ARUPS) and x-ray photoelectron spectroscopy (XPS). On SiC(0001) the interface is characterized by the so-called (6 root 3 x 6 root 3)R30 degrees reconstruction. The homogeneity of this phase is influenced by the preparation procedure. Yet, it appears to be crucial for the quality of further graphene growth. We discuss the role of three structures with periodicities (6 root 3 x 6 root 3)R30 degrees, (6 x 6) and (5 x 5) present in this phase. The graphitization process can be observed by distinct features in the STM images with atomic resolution. The number of graphene layers grown can be controlled by the conical band structure of the pi-bands around the (K) over bar point of the graphene Brillouin zone as measured by laboratory-based ARUPS using UV light from He II excitation. In addition we show that the spot intensity spectra in LEED can also be used as fingerprints for the exact determination of the number of layers for the first three graphene layers. LEED data correlated to the ARUPS results allow for an easy and practical method for the thickness analysis of epitaxial graphene on SiC(0001) that can be applied continuously during the preparation procedure, thus paving the way for a large variety of experiments to tune the electronic structure of graphene for future applications in carbon electronics. On SiC(000 (1) over bar) graphene grows without the presence of an interface layer. The initial graphene layer develops in coexistence with intrinsic surface reconstructions of the SiC(000 (1) over bar) surface. In high resolution STM measurements we show atomically resolved graphene layers on top of the (3 x 3) reconstruction with a Moire type modulation by a large superlattice periodicity that indicates a weak coupling between the graphene layer and the substrate.
机译:石墨烯具有非常规的二维电子气特性,有望向纳米级碳电子学发展。可以通过Si升华在SiC上外延生长用于可能应用的大规模石墨烯层。在这里,我们报告了SiC基面表面上石墨烯的初始生长及其与表面重建的关系。通过扫描隧道显微镜(STM),低能电子衍射(LEED),角分辨紫外光电子能谱(ARUPS)和X射线光电子能谱(XPS)研究了表面。在SiC(0001)上,界面的特征是所谓的(6根3 x 6根3)R30度重构。该阶段的均匀性受制备程序的影响。然而,这对于进一步石墨烯生长的质量似乎至关重要。我们讨论了在此阶段存在的周期性周期性(6根3 x 6根3)R30度,(6 x 6)和(5 x 5)的三个结构的作用。可以通过具有原子分辨率的STM图像中的明显特征来观察石墨化过程。石墨烯层的生长数量可以通过石墨烯布里渊区的棒点上(K)周围的pi带的锥形带结构来控制,该锥形带结构是通过基于实验室的ARUPS使用He II激发的紫外光测量的。此外,我们显示,LEE​​D中的光点强度光谱也可以用作指纹,以精确确定前三个石墨烯层的层数。与ARUPS结果相关的LEED数据为在SiC(0001)上连续进行外延石墨烯的厚度分析提供了一种简单实用的方法,该方法可以在制备过程中连续应用,从而为各种实验调整电子学铺平了道路石墨烯的结构,可用于未来在碳电子领域的应用。在SiC(000(1)之上)上,石墨烯生长而没有界面层。初始石墨烯层与SiC(000(1)over bar)表面的固有表面重建共存。在高分辨率STM测量中,我们显示了在(3 x 3)重建之上的原子分辨的石墨烯层,该波纹具有大的超晶格周期性,这表明该膜层与基底之间的耦合较弱,并且具有Moire型调制。

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