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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Small signal thermal analysis of local multibarrier behaviour in SiC Schottky diodes
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Small signal thermal analysis of local multibarrier behaviour in SiC Schottky diodes

机译:SiC肖特基二极管中局部多势垒行为的小信号热分析

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A nickel-based silicon carbide Schottky barrier diode presenting multibarrier behaviour was inspected by Small sIgnal Modulation for Thermal Analysis (SIMTA) to detect the weak spots responsible for this behaviour. SIMTA thermally modulates in frequency such weak spots with a small signal voltage while the device is electrically biased in an operating point of its static I /V curve (20 A–1 kV capability). This allows for quantitative studying of them in a thermal steady state as heat sources by lock-in thermography depending on the device operating regime. Using SIMTA, the barrier height and the area of each weak spot were determined by thermal means, yielding to an electrical model that fits the observed multibarrier behaviour. Results suggest that these spots were caused by surface areas of high density of states (due to 3C–SiC stacking faults) created during the wire bonding process, which locally shifted the Schottky barrier due to Fermi level pinning. Their origin was confirmed by scanning electron microscope inspections after milling these locations with a focused on beam, detecting Schottky metal contact degradation at weak spot locations due to an excessive bonding pressure.
机译:通过热分析小信号调制(SIMTA)检查了呈现多势垒行为的镍基碳化硅肖特基势垒二极管,以检测造成此行为的薄弱环节。当器件在其静态I / V曲线(20 A–1 kV能力)的工作点上受到电偏置时,SIMTA会以较小的信号电压对此类弱点进行频率热调制。这样就可以根据设备的工作方式,通过锁定热成像技术对作为热源的热稳定状态下的材料进行定量研究。使用SIMTA,通过热手段确定势垒高度和每个弱点的面积,从而得出适合所观察到的多势垒行为的电气模型。结果表明,这些斑点是由在引线键合过程中产生的高密度状态表面积(由于3C-SiC堆叠缺陷)引起的,由于费米能级钉扎而使肖特基势垒局部移动。通过聚焦电子束铣削这些位置后,通过扫描电子显微镜检查确认了它们的起源,并检测了由于过高的键合压力在弱点位置处的肖特基金属接触退化。

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