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Nanocrystalline ZnO Thin Film Deposition on Flexible Substrate by Low-Temperature Sputtering Process for Plastic Displays

机译:低温溅射工艺在柔性显示器上纳米晶ZnO薄膜的沉积

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摘要

A low temperature sputter deposition process is adopted to fabricate nanocrystalline ZnO thin films on plastic (polyethylene terepthalate) substrate. Very good crystalline films are synthesized at a substrate temperature around 120℃. Structural and microstructural analyses confirm the proper phase formation of the nanomaterial with an average nanoparticle size around 5-10 nm. Optical transmission analysis of the film deposited on plastic substrate depicts nearly 90% visible transmittance with a direct bandgap around 3.56 eV. This cost-effective, low-temperature fabrication of nanocrystalline thin film with very good structural and optical properties will find important applications in plastic display technology. Also the process is a vacuum-based clean process, which is compatible to CMOS-IC fabrication techniques and therefore, can easily be integrated with modern solid state device fabrication processes for diverse device applications.
机译:采用低温溅射沉积工艺在塑料(聚对苯二甲酸乙二醇酯)衬底上制备纳米ZnO薄膜。在120℃左右的基板温度下合成了非常好的结晶膜。结构和微观结构分析证实了纳米材料的适当相形成,其平均纳米颗粒尺寸约为5-10 nm。沉积在塑料基材上的薄膜的光透射率分析显示,可见光透射率接近90%,带隙约为3.56 eV。具有很好的结构和光学特性的这种低成本,低成本的纳米晶体薄膜的低温制造将在塑料显示技术中找到重要的应用。该工艺也是基于真空的清洁工艺,该工艺与CMOS-IC制造技术兼容,因此可以轻松地与现代固态器件制造工艺集成,以用于各种器件应用。

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