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Defects related room temperature ferromagnetism in Cu-implanted ZnO nanorod arrays

机译:铜注入的ZnO纳米棒阵列中与室温铁磁有关的缺陷

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Room temperature ferromagnetism (FM) was observed in Cu-implanted ZnO nanorod arrays. The implantation dose for Cu ions was 1 × 10~(16) cm~(-2) and the implantation energy was 100 keV. The ion implantation induced defects and disorder has been observed by the XRD, PL and TEM experiments. The PL spectrum revealed a dominant luminescence peaks at 390 nm and a broad and strong green emission at 500-700 nm, which is considered to be related to the ionized oxygen vacancy. Cu-implanted ZnO nanorods annealed at 500 °C show a saturation magnetization value of 1.82 μ_B/CU and a positive coercive field of 68 Oe. The carrier concentration is not much improved after annealing and in the order of 10~(16) cm~(-3), which suggests that FM does not depend upon the presence of a significant carrier concentration. The origin of ferromagnetism behavior can be explained on the basis of electrons and defects that form bound magnetic polarons, which overlap to create a spin-split impurity band.
机译:在注入铜的ZnO纳米棒阵列中观察到室温铁磁(FM)。铜离子的注入剂量为1×10〜(16)cm〜(-2),注入能量为100 keV。通过XRD,PL和TEM实验已经观察到离子注入引起的缺陷和无序。 PL光谱显示出在390nm处的主要发光峰和在500-700nm处的宽而强的绿色发射,这被认为与电离的氧空位有关。在500°C退火的注入Cu的ZnO纳米棒的饱和磁化值为1.82μB/ CU,矫顽场为68 Oe。退火后,载流子浓度没有太大的改善,大约为10〜(16)cm〜(-3),这表明FM并不取决于显着的载流子浓度。可以根据形成束缚的磁极化子的电子和缺陷来解释铁磁性行为的起源,这些电子和缺陷重叠形成自旋分裂的杂质带。

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