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Non-alloyed Cr/Au Ohmic contacts to N-face and Ga-face n-GaN

机译:N面和Ga面n-GaN的非合金Cr / Au欧姆接触

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摘要

Non-alloyed Cr/Au Ohmic contacts on N-face and Ga-face n-GaN were studied. The specific contact resistances (ρ_c) of Cr/Au contacts onto the N-face and Ga-face n-GaN were as low as 2.4 x 10~(-4) Ω cm~2 and 2.4 x 10~(-5)Ωcm~2, respectively. Native oxide formed on the n-GaN surface was believed to be the key factor for higher ρ_c. The results of X-ray photoelectron spectroscopy confirmed that n-GaN samples with different surface polarities or treated by different chemical solutions exhibited significant differences in gallium oxide content on the surface, which led to a marked difference in the ρ_c of non-alloyed Cr/Au Ohmic contacts to GaN films.
机译:研究了N面和Ga面n-GaN上的非合金Cr / Au欧姆接触。 Cr / Au接触N面和Ga面n-GaN的比接触电阻(ρ_c)低至2.4 x 10〜(-4)Ωcm〜2和2.4 x 10〜(-5)Ωcm 〜2。据信在n-GaN表面上形成的天然氧化物是提高ρ_c的关键因素。 X射线光电子能谱的结果证实,具有不同表面极性或经过不同化学溶液处理的n-GaN样品的表面氧化镓含量存在显着差异,这导致非合金Cr /的ρ_c明显不同。金欧姆接触GaN膜。

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