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Effects of chemical treatment on barrier height and ideality factors of Au/GaN Schottky diodes

机译:化学处理对Au / GaN肖特基二极管势垒高度和理想因子的影响

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摘要

We have studied Au-GaN Schottky barrier diodes. GaN surfaces have been prepared by cleaning in HCl and (NH4)(2)S prior to metal deposition. The zero-biased barrier heights and ideality factors obtained from the current-voltage characteristics differ from diode to diode, although all the samples were prepared identically. The statistical analysis for the reverse bias C-V data yielded mean value of (1.35 +/- 0.04) eV for Schottky barrier height of HCl treated sample and (1.20 +/- 0.03) eV for (NH4)(2)S sample, where 9 dots were considered from each cleaning method. It was found that the barrier height values obtained from the C-2-V (1.43 eV) and I-V characteristics (0.89 eV) are different from each other by 0.54 eV. The inhomogeneous barrier heights were found to be related to the effect of the high series resistance on diode parameters (Akkilic et al., 2004) [1].
机译:我们已经研究了Au / n-GaN肖特基势垒二极管。通过在金属沉积之前用HCl和(NH4)(2)S清洁来制备GaN表面。尽管所有样品的制备方法相同,但从电流-电压特性获得的零偏势垒高度和理想因子因二极管而异。反向偏置CV数据的统计分析得出HCl处理的样品的肖特基势垒高度的平均值为(1.35 +/- 0.04)eV,(NH4)(2)S样品的平均值为(1.20 +/- 0.03)eV,其中9每种清洁方法都考虑了点。发现由C-2-V(1.43eV)和I-V特性(0.89eV)获得的势垒高度值彼此相差0.54eV。发现不均匀的势垒高度与高串联电阻对二极管参数的影响有关(Akkilic等,2004)[1]。

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