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Effect of substrate doping on microstructure and reactivity of porous silicon

机译:衬底掺杂对多孔硅微结构和反应性的影响

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The effect of substrate doping and the choice of oxidizer on the reactivity of energetic porous siliconoxidizer composites were examined in this study. Porous silicon samples were prepared from N and P-type substrates with widely different dopant concentrations, and impregnated with perchlorate salts or sulfur to form energetic composites, which were characterized using differential scanning calorimetry. While the low temperature exothermic reactions with perchlorate salts were found to be unaffected by the substrate doping properties, low temperature reactions with sulfur were found to be affected by the substrate doping. This is attributed to the effect of substrate doping on the microstructure of the porous silicon formed.
机译:在这项研究中,研究了基质掺杂和氧化剂的选择对高能多孔氧化硅复合材料反应性的影响。用掺杂剂浓度差异很大的N和P型衬底制备多孔硅样品,并用高氯酸盐或硫浸渍以形成高能复合材料,使用差示扫描量热法对其进行表征。虽然发现与高氯酸盐的低温放热反应不受衬底掺杂性能的影响,但发现与硫的低温反应受衬底掺杂的影响。这归因于衬底掺杂对所形成的多孔硅的微观结构的影响。

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