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首页> 外文期刊>Journal of Research of the National Institute of Standards and Technology >Degradation of GaAs/AlGaAs Quantized Hall Resistors With Alloyed AuGe/Ni Contacts
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Degradation of GaAs/AlGaAs Quantized Hall Resistors With Alloyed AuGe/Ni Contacts

机译:具有合金化AuGe / Ni触点的GaAs / AlGaAs量化霍尔电阻的性能下降

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Careful testing over a period of 6 years of a number of GaAs/AlGaAs quantized Hall resistors(QHR) made with alloyed AuGe/Ni contacts,both with and without passivating silicon nitride coatings,has resulted in the identification of important mechanisms responsible for degradation in the perfor mance of the devices as resistance standards.Covering the contacts with a film,such as a low-temperature silicon nitride,that is impervious to humidity and other contaminants in the atmosphere prevents the contacts from degrading.The devices coated with silicon nitride used in this study,however,showed the effects of a conducting path in parallel with the 2-dimensional electron gas (2-DEG) at temperatures above 1.1k which interferes with their use as resistance standards.Several possible causes of this parallel conduction are evaluated.On the basis of this work,two methods are proposed for protecting QHR devices with alloyed AuGe/Ni contacts from degradation:the heterostructure can be left unpassivated,;;but the alloyed contacts can be completely covered with a very thick(>3 um) coating of gold;or the GaAs cap layer can be carefully etched away after alloying the contacts and prior to depositing a passivating silicon nitride coating over the entire sample.Of the two,the latter is more challenging to effect,but preferable because both the contacts and the heterostructure are protected from corrosion and oxidation
机译:经过6年的仔细测试,对采用合金化AuGe / Ni触点制成的GaAs / AlGaAs量化霍尔电阻(QHR)进行了测试,无论是否钝化氮化硅涂层,都已确定了导致氮化镓降解的重要机理。器件的性能作为电阻标准。用一层不可渗透的薄膜(例如低温氮化硅)覆盖大气中的湿气和其他污染物,以防止触点退化。然而,在这项研究中,显示了在高于1.1k的温度下与二维电子气(2-DEG)平行的导电路径的影响,这干扰了它们用作电阻标准。评估了这种平行导电的几种可能原因在这项工作的基础上,提出了两种方法来保护具有合金化AuGe / Ni触头的QHR器件不被降解:异质结构可以保持钝化;但是合金化的触头可以被非常厚的(> 3 um)金涂层完全覆盖;或者可以在对触头合金化之后并且在钝化的氮化硅涂层上沉积钝化氮化硅涂层之前小心地蚀刻掉GaAs盖层。两者之间,后者的作用更具挑战性,但由于接触和异质结构均受到腐蚀和氧化的保护,因此较为可取

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