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Degradation of GaAs/AlGaAs Quantized Hall Resistors With Alloyed AuGe/Ni Contacts

机译:具有合金化AuGe / Ni触点的GaAs / AlGaAs量化霍尔电阻的性能下降

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摘要

Careful testing over a period of 6 years of a number of GaAs/AlGaAs quantized Hall resistors (QHR) made with alloyed AuGe/Ni contacts, both with and without passivating silicon nitride coatings, has resulted in the identification of important mechanisms responsible for degradation in the performance of the devices as resistance standards. Covering the contacts with a film, such as a low-temperature silicon nitride, that is impervious to humidity and other contaminants in the atmosphere prevents the contacts from degrading. The devices coated with silicon nitride used in this study, however, showed the effects of a conducting path in parallel with the 2-dimensional electron gas (2-DEG) at temperatures above 1.1 K which interferes with their use as resistance standards. Several possible causes of this parallel conduction are evaluated. On the basis of this work, two methods are proposed for protecting QHR devices with alloyed AuGe/Ni contacts from degradation: the heterostructure can be left unpassivated, but the alloyed contacts can be completely covered with a very thick (> 3 μm) coating of gold; or the GaAs cap layer can be carefully etched away after alloying the contacts and prior to depositing a passivating silicon nitride coating over the entire sample. Of the two, the latter is more challenging to effect, but preferable because both the contacts and the heterostructure are protected from corrosion and oxidation.
机译:经过6年的仔细测试,对采用合金化AuGe / Ni触点制成的GaAs / AlGaAs量化霍尔电阻(QHR)进行了钝化或不钝化氮化硅涂层的研究,结果已经确定了导致氮化镓降解的重要机理。器件的性能作为电阻标准。用诸如低温氮化硅之类的膜覆盖触点,该薄膜不受湿度和大气中的其他污染物的影响,可以防止触点退化。但是,在这项研究中使用的涂有氮化硅的器件在高于1.1 K的温度下显示了与二维电子气(2-DEG)平行的导电路径的影响,这妨碍了它们用作电阻标准。评估了这种平行传导的几种可能原因。在这项工作的基础上,提出了两种方法来保护带有合金化AuGe / Ni触点的QHR器件免于退化:异质结构可以不钝化,但是合金化触点可以完全覆盖一层非常厚的(> 3μm)涂层。金;可以在将触点合金化之后,然后在整个样品上沉积钝化氮化硅涂层之前,仔细地蚀刻掉GaAs盖层。在这两者中,后者的实现更具挑战性,但由于接触和异质结构均受到保护,不会受到腐蚀和氧化的影响,因此更可取。

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