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Quantized conductance and electron focusing spectra of GaAs/AlGaAs point contacts fabricated optical lithography

机译:GaAs / AlGaAs点接触式光学光刻的量化电导和电子聚焦谱

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摘要

Split gate quantum point contacts on a two-dimensional electron gas (2DEG) of GaAs/AlGaAs heterostructures are fabricated using conventional optical lithography. The typical opening of the split gates ranges from 0.25 to 0.5 µm. Applying negative voltages to the gate introduces horn-shaped constrictions. In a double point contact device, the point contact conductances are measured as a function of gate voltage, and transverse electron focusing is studied using one point contact to inject electrons ballistically into the 2DEG and the other to collect the electrons. Clear quantized conductance steps in units of 2e2/h are found at temperatures between 0.1 and 2 K. Also, electron focusing spectra are obtained for various point contact widths and some features are characterized by the geometry of the split gate.
机译:使用常规的光刻技术,可以在GaAs / AlGaAs异质结构的二维电子气(2DEG)上制造分栅量子点触点。分离栅的典型开口范围为0.25至0.5 µm。向栅极施加负电压会产生喇叭状的收缩。在双点接触装置中,测量点接触电导随栅极电压的变化,并研究横向电子聚焦,方法是使用一个点接触将电子弹道注入2DEG,另一个将其收集以收集电子。在0.1和2 K之间的温度下,可以发现以2e2 / h为单位的清晰的量化电导阶跃。此外,还获得了针对各种点接触宽度的电子聚焦谱,并且某些特征由分离栅的几何形状表征。

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