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首页> 外文期刊>Journal of the Physical Society of Japan >Effects of Intrinsic Defects and Substrate Transfer Doping on the Electronic Structure of Sb_2Te_3 Thin Films on Graphene
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Effects of Intrinsic Defects and Substrate Transfer Doping on the Electronic Structure of Sb_2Te_3 Thin Films on Graphene

机译:固有缺陷和衬底转移掺杂对石墨烯上Sb_2Te_3薄膜电子结构的影响

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摘要

We study how the electronic structure of the Sb_2Te_3 thin films on graphene changes with intrinsic defects and substrate transfer doping using first-principles calculations. We find that for freestanding Sb_2Te_3 thin films without defects band gap decreases with increasing film thickness, and that the behavior of three-dimensional topological insulators does not appear up to seven quintuple layers. The orbital degeneracy is broken by defects and substrate transfer doping, leading to the Rashba effect and a reduced band gap. By decreasing the defect ratio of Sb vacancies (V_(Sb)) as the primary source of p-type conductivity and increasing that of Te-on-Sb antisites (Te_(Sb)) as the primary source of n-type conductivity, coupled with a transfer doping using a graphene substrate, the energy band of Sb_2Te_3 thin films can be tuned from the p-type to the n-type. Differences in the local defects of Sb_2Te_3 can result in variations in the work function and intrinsic defects have a stronger effect on the work function than the graphene substrate.
机译:我们使用第一性原理研究了石墨烯上Sb_2Te_3薄膜的电子结构如何随固有缺陷和衬底转移掺杂而变化。我们发现,对于无缺陷的独立式Sb_2Te_3薄膜,带隙会随着膜厚度的增加而减小,并且三维拓扑绝缘体的行为不会出现多达七个五层的现象。缺陷和基质转移掺杂会破坏轨道的简并性,从而导致Rashba效应和减小的带隙。通过降低作为p型电导率主要来源的Sb空位(V_(Sb))的缺陷率并增加作为n型电导率主要来源的Te-on-Sb反位点(Te_(Sb))的缺陷率,通过使用石墨烯衬底的转移掺杂,Sb_2Te_3薄膜的能带可以从p型调谐到n型。 Sb_2Te_3局部缺陷的差异会导致功函数的变化,固有缺陷对功函数的影响要大于石墨烯衬底。

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