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Effects of different interlayers on indium-tin oxide thin films sputtered on flexible PET substrates

机译:不同中间层对柔性PET基板上溅射的铟锡氧化物薄膜的影响

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摘要

Using radio-frequency magnetron sputtering, various interlayer materials (Cu, Al, Ag, and ZnO) were added to indium-tin oxide (ITO) films on a polyethylene terephthalate (PET) flexible substrate, and were compared to examples made without an interlayer. The effects of the interlayer on the ITO were investigated with X-ray diffractometry (XRD), visible wavelength photospectrometry, four-point probe electrical resistivity, and micro-scratch adhesion tests, which were all conducted at four temperatures (25°C, 35°C, 55°C, and 75°C). The ITO crystallographic texture was overwhelmingly found to be (2 2 2), for all combinations considered. The grain size was reduced in the ITO films having interlayers of Ag or Cu, and was enlarged by the ZnO. The visible light transmittance remained almost unchanged for the Al and ZnO buffers, but Ag and Cu failed to maintain the industry standard of 75-80% for a transparent film. Cu, ZnO, and especially Ag, effectively reduced, whereas, Al increased the sheet resistance of the ITO. Upon heating, the scratch resistance diminished in all cases, excluding Cu, while the sheet resistance grew with respect to temperature, for all films except those with Ag. The XRD intensity and the light transmittance were not significantly affected by temperature.
机译:使用射频磁控溅射,将各种夹层材料(Cu,Al,Ag和ZnO)添加到聚对苯二甲酸乙二醇酯(PET)柔性基板上的铟锡氧化物(ITO)膜中,并与不带夹层的示例进行比较。通过X射线衍射法(XRD),可见光波长光谱法,四点探针电阻率和微划痕附着力测试研究了中间层对ITO的影响,这些均在四个温度(25°C,35 °C,55°C和75°C)。对于所有考虑的组合,绝大多数发现ITO晶体学织构为(2 2 2)。在具有Ag或Cu的中间层的ITO膜中,晶粒尺寸减小,并且通过ZnO增大。对于Al和ZnO缓冲液,可见光透射率几乎保持不变,但是Ag和Cu未能保持透明膜的行业标准75-80%。 Cu,ZnO,尤其是Ag有效地减少了,而Al增加了ITO的薄层电阻。加热后,除含Ag的所有薄膜外,所有情况下(不包括Cu)的耐划痕性均降低,而薄层电阻随温度的升高而增加。 XRD强度和透光率不受温度的显着影响。

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