摘要:Nine kinds of glazes were obtained by L9(34) orthogonal testing, using kaolin, quartz, limestone, feldspar as raw materials. Their melting characteristics were comprehensively analyzed, and the 8th glaze was determined as the research subject. The microstructure of the glaze was analyzed by ifeld emission scanning electron microscope and the inlfuence of the glaze on the oxidation resistance of MoSi2 at low temperature was investigated. The results show that, with the ifring temperature increasing, glazes were prone to spread over the matrix, resulting in the defects decreasing. When the firing temperature reached 1250℃, the defects reduced dramatically. Thus, the optimum ifring temperature was determined as 1250℃. As the soaking time increased, the defects of the glazes signiifcantly reduced, with the ifring temperature remaining at 1250℃. In the oxidation tests at 500℃ in the air, the weight gain of the unglazed MoSi2 increased approximately linearly, the weight of the glazed MoSi2 with the thickness of glaze layer varying from 4.8 μm to 20.8 μm almost unchanged, indicating that the glaze can signiifcantly improve the oxidation resistance of MoSi2 at low temperature.%以高岭土、长石、石灰石、石英为原料,采用L9(34)正交实验设计了9种釉料,对其熔融特性进行综合分析,选择8号釉料作为研究对象,采用场发射扫描电子显微镜观察了釉面的显微结构,探究了釉层对MoSi2发热体低温抗氧化性的影响。结果表明:随着烧成温度的提高,釉层更易铺展于基体,使得釉面缺陷减少,温度升高到1250℃时,釉面缺陷明显减少,因此确定最佳烧成温度为1250℃,在该温度保温,随保温时间的延长,釉面缺陷明显减少;在空气中进行500℃氧化试验,发现未涂覆釉的MoSi2的氧化增重近似呈线性增加,涂覆釉层厚度范围约为4.8-20.8μm的MoSi2质量几乎无变化,说明釉可以明显改善MoSi2的低温抗氧化性。