PURPOSE: A production method of a metal oxide thin film is provided to produce the metal oxide thin film at low temperatures by the chemical reaction among catalyst solution particles and metal oxide precursor solution particles.;CONSTITUTION: A production method of a metal oxide thin film comprises the following steps: preparing a metal oxide precursor solution and a catalyst solution (S10); applying electrostatic force to the metal oxide precursor solution and the catalyst solution, and spraying metal oxide precursor solution particles and catalyst solution particles to a substrate at the same time (S20); and producing the metal oxide thin film by the chemical bonding among the metal oxide precursor solution particles and the catalyst solution particles on the substrate (S30). The metal oxide precursor solution is a sol-gel solution containing a metal oxide precursor and a solvent. The spraying step uses an electrostatic spray process. The temperature of the substrate is 120-300°C.;COPYRIGHT KIPO 2013;[Reference numerals] (S10) Injecting a first solution into a first nozzle and a second solution into a second nozzle; (S20) Applying high electrostatic force between sprayer and substrate supporter to form first solution particles and second solution particles; (S30) Forming a thin film by simultaneously spraying the first and the second particles on the substrate
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