Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

摘要

Novel alkaline developable top-coat materials containing a bulky silicon group are presented.This bulky silicon group endows transparency at 193 nm wavelength and hydrophobicity to the top-coat.Good pattern profiles and negligible changes of lithographic performance are confirmed on ArF photoresists.Receding angle of this top-coat is 90 deg,which is the highest among alkaline developable top-coats reported to date,and only comparable by solvent soluble-type top-coat TSP3A.