Surface Property Control for 193nm Immersion Resist

摘要

The surface property of the resist film is critical for photoresist processing especially for immersion lithography.To control the interaction between resist film and water fluid,the polymer blend between the conventional acryl polymer and the fluorine-containing homo-polymer are examined.The polymer blend successfully modifies the film surface as verified by the dynamic contact angle measurement.The distribution of the blend polymer in the film gives an impact to the surface property.The surface can be also controlled by the use of blended polymer without any impact on the pattern profile at 193nm dry exposure.However,the optimization in resist formulation is necessary to achieve both the hydrophobic surface and imaging performance for a topcoat-less resist processing.