X-ray spectrometry for wafer contamination analysis and speciationas well as for reference-free nanolayer characterization

摘要

Monochromatized synchrotron radiation of the electron storage ring BESSY II in Berlin has beenused for the non-destructive investigation of wafer surface contamination and nanolayered materialsby X-ray spectrometry. For this purpose the fluorescence spectra of various samples have beenrecorded in different geometries: varying the incident angle from close to zero degrees, i.e. total-reflection geometry (T), over grazing incidence (GI) to conventional X-ray fluorescence (XRF). InTXRF geometry only the surface is analyzed, whereas GIXRF and XRF provide information fromsubsurface layers respectively the bulk of a sample.