首页> 外文会议>International Symposium on Ultra Clean Processing of Semiconductor Surfaces >X-ray spectrometry for wafer contamination analysis and speciation as well as for reference-free nanolayer characterization
【24h】

X-ray spectrometry for wafer contamination analysis and speciation as well as for reference-free nanolayer characterization

机译:X射线光谱法用于晶片污染分析和物种以及可参考的纳米组表征

获取原文

摘要

Monochromatized synchrotron radiation of the electron storage ring BESSY II in Berlin has been used for the non-destructive investigation of wafer surface contamination and nanolayered materials by X-ray spectrometry. For this purpose the fluorescence spectra of various samples have been recorded in different geometries: varying the incident angle from close to zero degrees, i.e. total-reflection geometry (T), over grazing incidence (GI) to conventional X-ray fluorescence (XRF). In TXRF geometry only the surface is analyzed, whereas GIXRF and XRF provide information from subsurface layers respectively the bulk of a sample.
机译:柏林电子储存环Bessy II的单色化同步辐射已被用于通过X射线光谱测定的晶片表面污染和纳米材料的非破坏性研究。为此目的,各种样品的荧光光谱已被记录在不同的几何形状中:将入射角从接近零度,即总反射几何形状(T),以传统的X射线荧光(XRF)上的放牧发病率(GI) 。在TXRF几何中,仅分析表面,而GixRF和XRF分别提供来自地下层的信息分别是样本的大部分。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号