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首页> 外文期刊>Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena >X-ray spectrometry for wafer contamination analysis and speciation as well as for reference-free nanolayer characterization
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X-ray spectrometry for wafer contamination analysis and speciation as well as for reference-free nanolayer characterization

机译:X射线光谱法,用于晶片污染分析和形态分析,以及无参考的纳米层表征

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摘要

Monochromatized synchrotron radiation of the electron storage ring BESSY II in Berlin has been used for the non-destructive investigation of wafer surface contamination and nanolayered materials by X-ray spectrometry. For this purpose the fluorescence spectra of various samples have been recorded in different geometries: varying the incident angle from close to zero degrees, i e, total-reflection geometry (T), over grazing incidence (GI) to conventional X-ray fluorescence (XRF), In TXRF geometry only the surface is analyzed, whereas GIXRF and XRF provide information from subsurface layers respectively the bulk of a sample.
机译:柏林电子存储环BESSY II的单色同步加速器辐射已用于通过X射线光谱法对晶圆表面污染和纳米层材料进行无损研究。为此,已在不同的几何形状下记录了各种样品的荧光光谱:将入射角从接近零度(即全反射几何形状(T))改变为掠射入射(GI)到常规X射线荧光(XRF) ),在TXRF几何形状中,仅分析表面,而GIXRF和XRF提供分别来自地下层或整个样品的信息。

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