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Electromigration-Induced Void Formation at the Cu_(5)Zn_(8)/Solder Interface in a Cu/Sn-9Zn/Cu Sandwich

机译:Cu / Sn-9Zn / Cu三明治中Cu_(5)Zn_(8)/焊锡界面处的电迁移诱导的空隙形成

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摘要

The electromigration that occurs in a Cu/Sn-9Zn/Cu sandwich was investigated for void formation at room temperature with 10~(3) A/cm~(2). A focused ion beam revealed that voids nucleated at the intermetallic compound (IMC)/solder interface regardless of the electron flow direction. The needle-like voids initiated at the cathode Cu_(5)Zn_(8)/solder interface due to the outward diffusion of Zn atoms in the Zn-rich phase and expanded as a result of the surface diffusion of Sn atoms upon current stressing.
机译:研究了在Cu / Sn-9Zn / Cu夹层中发生的电迁移,在室温下以10〜(3)A / cm〜(2)形成空穴。聚焦的离子束显示,无论电子流动方向如何,在金属间化合物(IMC)/焊料界面处形成核的空隙都是如此。针状空隙在阴极Cu_(5)Zn_(8)/焊料界面处开始,这是由于Zn原子在富Zn相中向外扩散所致,并由于电流应力下Sn原子的表面扩散而膨胀。

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