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Single crystal CVD diamond growth strategy by the use of a 3D geometrical model: Growth on (113) oriented substrates

机译:使用3D几何模型的单晶CVD金刚石生长策略:在(113)取向的衬底上生长

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The quality of single crystal diamond obtained by microwave CVD processes has been drastically improved in the last 5 years thanks to surface pre-treatment of the substrates [A. Tallaire, J. Achard, F. Silva, R.S. Sussmann, A. Gicquel, E. Rzcpka, Physica Status Solidi (A) 201, 2419-2424 (2004); G. Bogdan, M. Nesladek, J. D'Haen, J. Maes, V.V. Moshchalkov, K. Haenen, M. D'Olieslaeger, Physica Status Solidi (A) 202, 2066-2072 (2005); M. Yamamoto, T. Tcraji, T. Ito, Journal of Crystal Growth 285,130-136 (2005)]. Additionally, recent results have unambiguously shown the occurrence of (110) faces on crystal edges and (113) faces on crystal comers [F. Silva, J. Achard, X. Bonnin, A. Michau, A. Tallaire, O. Brinza, A. Gicquel, Physica Status Solidi (A) 203, 3049-3055 (2006)]. We have developed a 3D geometrical growth model to account for the final crystal morphology. The basic parameters of this growth model are the relative displacement speeds of (111), (110) and (113) faces normalized to that of the (100) faces, respectively alpha, beta, and gamma. This model predicts both the final equilibrium shape of the crystal (i.e. after infinite growth time) and the crystal morphology as a function of alpha, beta, gamma, and deposition time.An optimized operating point, deduced from the model, has been validated experimentally by measuring the growth rate in (100), (111), (110), and (113) orientations. Furthermore, the evolution of alpha, beta,gamma as a function of methane concentration in the gas discharge has been established. From these results, crystal growth strategies can be proposed in order, for example, to enlarge the deposition area. In particular, we will show, using the growth model, that the only possibility to significantly increase the deposition area is, for our growth conditions, to use a (113) oriented substrate. A comparison between the grown crystal and the model results will be discussed and characterizations of the grown film (Photoluminescence spectroscopy, EPR, SEM) will be presented.
机译:在过去的5年中,由于对基材进行了表面预处理,通过微波CVD工艺获得的单晶金刚石的质量得到了极大的提高[A. Tallaire,J.Achard,F.Silva,R.S。 Sussmann,A.Gicquel,E.Rzcpka,Physica Status Solidi(A)201,2419-2424(2004); G.Bogdan,M.Nesladek,J.D'Haen,J.Maes,V.V。 Moshchalkov,K.Haenen,M.D'Olieslaeger,Physica Status Solidi(A)202,2066-2072(2005); M. Yamamoto,T。Tcraji,T。Ito,《晶体生长学报》 285,130-136(2005)]。另外,最近的结果清楚地表明在晶体边缘上出现了(110)面,在晶体角上出现了(113)面[F. Silva,J.Achard,X.Bonnin,A.Michau,A.Tallaire,O.Brinza,A.Gicquel,Physica Status Solidi(A)203,3049-3055(2006)]。我们已经开发了3D几何生长模型来说明最终的晶体形态。该增长模型的基本参数是将(111),(110)和(113)面的相对位移速度标准化为(100)面的相对位移速度,分别为alpha,β和γ。该模型可以预测晶体的最终平衡形状(即无限长的生长时间之后)以及晶体形态随α,β,γ和沉积时间的变化。从模型推导的最佳工作点已通过实验验证通过测量(100),(111),(110)和(113)方向的增长率。此外,已经确定了α,β,γ随气体排放中甲烷浓度的变化。根据这些结果,可以提出晶体生长策略,例如以扩大沉积面积。特别是,我们将使用生长模型表明,对于我们的生长条件,显着增加沉积面积的唯一可能性是使用(113)取向的衬底。将讨论生长晶体与模型结果之间的比较,并描述生长膜的特征(光致发光光谱,EPR,SEM)。

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