Formation of cubic boron nitride thin films using ECR plasma enhanced CVD

摘要

Cubic boron nitride containing thin films were deposited on (100) Si and steel substrates using electron cyclotron resonance plasma enhanced chemical vapor deposition. The deposition chamber is designed for large area coatings. Dynamic properties of the ECR plasma were stuided using a Langmuir probe. A uniform ion density of the order of 5*10~(11) cm~(-3) over the heater surface, which has a diameter of 18 cm, was obtained. A systematic optimization of the deposition parameters was carried out. The films were characterized using Fourier transform infrared infrared spectroscopy,transmission electron microscopy, X-ray photoelectron spectroscopy, atomic force microscopy, and ellipsometry. Under optimal conditons, homogeneous cubic boron nitride containing thin films were obtained on large area with a diameter of 12 cm. It was found that the films deposited on steel substrates have a long-term stability when compared with the films on Si substrates.